Gayle Murdoch
Gayle Murdoch graduated from the University of Edinburgh in 1997 with an honors degree in chemical physics. She began her career in the UK semiconductor manufacturing industry, first at NEC Semiconductors as a lithography engineer, and later joined Filtronic Compound Semiconductors, where she worked on etching development and integration for GaAs devices, eventually becoming a lead etch engineer. In 2008 she joined imec’s Advanced Lithography team before moving to BEOL integration in 2013. She has worked on a range of topics, including low k dielectric integration, fully self-aligned vias, and, most recently, semi-damascene integration. She currently holds the position of principal member of technical staff and leads the BEOL integration team

Authored articles

Imec demonstrates semi-damascene interconnects with fully self-aligned vias at 18nm metal pitch
Two-metal-level semi-damascene module yields excellent line/via resistance and reliability – a world first
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