February 22 - 26, 2026 | San Jose, California, USA
SPIE Advanced Lithography + Patterning
From materials to metrology: pushing the limits of lithography
At SPIE Advanced Lithography + Patterning
This placeholder content leans into lithography, patterning precision, and the broader ecosystem work needed to keep advanced semiconductor manufacturing moving forward.
It gives imec room to speak about materials, metrology, and pattern fidelity in a way that feels aligned with the conference audience and its technical expectations.
Lithography, patterning accuracy, and process control define the event narrative.
A credible place to position imec around materials, metrology, and manufacturing insight.
The copy intentionally sounds technical first and promotional second.