Victor M. Blanco Carballo
Victor M. Blanco Carballo has an MSc degree in Physics and an MSc degree in Electrical Engineering from the University of Zaragoza and the University of Valladolid, and holds a PhD degree in Microelectronics from the University of Twente. He worked at Nikhef developing radiation sensors for high energy physics and later on moved to ASML working on various topics like immersion defectivity, throughput, customer yield improvement and EUV defectivity. In 2015 he joined the Advanced Patterning Center at imec working as a research engineer in the EUV patterning of BEOL layers.
Authored articles
Imec pushes the limits of EUVL single exposure for future logic and memory
Imec has made considerable progress towards enabling extreme ultraviolet lithography (EUVL) single exposure of N5 32nm pitch metal-2 layers and of 36nm pitch contact holes. Greg McIntyre, Peter De Bisschop, Danilo De Simone, Frederic Lazzarino and Victor Blanco from the imec patterning team explain some of the key steps and highlight the impact on the semiconductor industry. The results have been presented in multiple papers at the 2018 SPIE Advanced Lithography Conference.
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