Vicky Philipsen
Vicky Philipsen received her PhD degree in solid-state physics from the University of Leuven (Belgium) in 2001. At imec she joined the Advanced Patterning department, where her research domain involves the study of mask 3D imaging effects in lithography (from 193nm to EUV and high NA EUV) both by simulations and experiments. She is leading the project on novel EUV mask absorbers at imec, including the technical task responsibility in European projects. She is team leader of 7 imaging researchers in the imec Advanced Patterning department and guides one PhD student.
Authored articles
High-NA EUV lithography: the next major step forward
In the course of 2025, we expect to see the introduction of the first high-NA extreme ultraviolet lithography (EUVL) equipment in high-volume manufacturing environments. These next-generation lithography systems will be key to advance Moore’s Law towards the logic 2nm technology generation and beyond. In this article, imec scientists and engineers involved in preparing this major engineering project (in partnership with ASML) talk about challenges and opportunities. They highlight recent insights. And they discuss the progress made in developing the patterning processes, metrology and photomasks needed for enabling the high-NA EUV lithography infrastructure.
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