Sofie Beyne
Sofie Beyne is a PhD student at imec and KU Leuven, researching electromigration in nano-interconnects as part of the REMO-team. In 2015 she received a master’s degree in materials science and engineering from KU Leuven, which included a one-year exchange program at EPFL in Switzerland. Her work is financed by the fund for scientific research in Flanders (FWO).
Authored articles
Si MOS quantum dot spin qubits: roads to upscaling
Multilinear quantum dot array enabled by EUV lithography promises leap forward in scaling up.
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New measuring method discovers and understands electromigration in chips much more quickly
Imec has developed a new, non-destructive method for measuring electromigration – one of the main reliability problems in chips. The new measuring method discovers and helps understand electromigration in chips much more quickly (and without destroying them) than the standard method.
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