Philippe Leray

Philippe Leray obtained his PhD degree in Physics of gas and plasma at the Paris-Sud University, after which he worked as a project manager in the European Joint Research Center in Ispra (Italy). In 2001, Philippe Leray joined imec as a research engineer and later as group leader of the litho process and pattern control group. His research is centered around metrology for lithography, including image-based and diffraction-based overlay, CD-SEM, scatterometry using ellipsometry, reflectometry and angle-resolved spectrometry, defectivity inspection and review for immersion lithography, resist characterization.