Mircea Dusa

Dr. Mircea V. Dusa is an imec fellow working in the field of sub-10nm patterning. He has more than 40 years of experience in the semiconductor industry, with expertise spanning exposure tools, mask making, metrology, process control, and the co-optimization of design and patterning processes.

Before joining imec in 2019, Mircea spent 20 years at ASML, where he was an ASML Fellow working on exploratory activities to enhance immersion and EUV exposure tools as holistic systems. He holds a master’s degree in electrical engineering and solid-state physics, and a PhD in applied optics from the Polytechnic University of Bucharest.