Greg McIntyre
Greg McIntyre is Director of Advanced Patterning at imec and responsible for areas related to advanced lithography equipment and process development, metrology and patterning process control, computational lithography, and exploratory patterning materials. Prior to joining imec, he was the technical lead for various areas of advanced lithography, imaging and modeling within the IBM research alliance in Albany, New York. He has published over 80 papers, won 7 best paper awards, and has launched a successful startup in the field. Prior to becoming a lithographer, Greg served as a Captain in the US Army. He holds a PhD and MS in Electrical Engineering from the University of California, Berkeley, and a B.S. from the United States Military Academy at West Point.
Authored articles
Imec pushes the limits of EUVL single exposure for future logic and memory
Imec has made considerable progress towards enabling extreme ultraviolet lithography (EUVL) single exposure of N5 32nm pitch metal-2 layers and of 36nm pitch contact holes. Greg McIntyre, Peter De Bisschop, Danilo De Simone, Frederic Lazzarino and Victor Blanco from the imec patterning team explain some of the key steps and highlight the impact on the semiconductor industry. The results have been presented in multiple papers at the 2018 SPIE Advanced Lithography Conference.
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