Frederic Lazzarino
Frederic Lazzarino received his MSc degree in Material Science from Joseph Fourier University (Grenoble, France) in 2000. He obtained his PhD degree in Physics in 2005 (LTM-CNRS, Grenoble, France) and joined Crocus technology, an MRAM company, in 2006, after 1 year at ST Microelectronics (Crolles, France). After 2 years as an MRAM etch engineer, he became researcher at imec, specialized in back-end-of-line (BEOL) dry etch processing. He is currently principal member of technical staff and he leads the BEOL etch team.
Authored articles
Imec pushes the limits of EUVL single exposure for future logic and memory
Imec has made considerable progress towards enabling extreme ultraviolet lithography (EUVL) single exposure of N5 32nm pitch metal-2 layers and of 36nm pitch contact holes. Greg McIntyre, Peter De Bisschop, Danilo De Simone, Frederic Lazzarino and Victor Blanco from the imec patterning team explain some of the key steps and highlight the impact on the semiconductor industry. The results have been presented in multiple papers at the 2018 SPIE Advanced Lithography Conference.
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